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| English | German |
| negative resist system | Negativlacksystem (it is one from which a negative of the mask used remains behind on the coated substrate, i.e. the resist remains where it is exposed to light) |
| negative resist system | negatives Resistsystem (it is one from which a negative of the mask used remains behind on the coated substrate, i.e. the resist remains where if is exposed to light) |
| negative resist system | negatives Fotoresistsystem (it is one from which a negative of the mask used remains behind on the coated substrate, i.e. the resist remains where it is exposed to light) |
| photosensitive resist | Fotolack |
| positive resist system | positives Resistsystem (it leaves a positive image in the irradiated resist film after the expose and develop process, i.e. the photoresist remains where it is not exposed to light or it develops away where it is exposed to light and the image is a replica or positive of the mask used) |
| positive resist system | Positivlacksystem (it leaves a positive image in the irradiated resist film after the expose and develop process, i.e. the photoresist remains where it is not exposed to light or it develops away where it is exposed to light and the image is a replica or positive of the mask used) |
| positive resist system | positives Fotoresistsystem (it leaves a positive image in the irradiated resist film after the expose and develop process, i.e., the photoresist remains where it is not exposed or it develops away where it is exposed to light and the image is a replica or positive of the mask used) |
| resist coating | Lackschicht (film) |
| resist stripping | Abziehen des Lackes |