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| English | German |
| albumen positive | Albuminpositiv |
| all-positive | durchweg positiv |
| central positive element | mittlere Sammellinse |
| light-positive photophoresis | positive Fotophorese (movement of suspended particles in the sense of the propagation of light) |
| positive addition | positive Zusatzwirkung |
| positive centring | Zwangszentrierung |
| positive copy | Positivkopie (print) |
| positive crown element | positive Kronglaslinse |
| positive crystal | optisch positiver Kristall |
| positive curvature | positive Krümmung |
| positive developer | Entwickler für Positive |
| positive distortion | kissenförmige Verzeichnung (image defects caused by variations in lateral magnification of the lens over the image field) |
| positive engagement | zwangsläufiger Eingriff |
| positive in action | kraftschlüssig |
| positive in sign | mit positivem Vorzeichen |
| positive spherical lens | Plusglas |
| positive lens | Positivlinse (forming an inverted image of a distant object) |
| positive lens | Sammellinse (forming an inverted image of a distant object) |
| positive lens | Konvexglas |
| positive lens carriage | Positivlinsenwagen |
| positive location | formschlüssige Positionierung |
| positive location | arretierte Lage |
| positive meniscus | sammelnder Meniskus |
| positive phase contrast | positiver Phasenkontrast |
| positive photoresist system | Positivlacksystem (it leaves a positive image in the irradiated resist film after the expose and develop process, i.e. the photoresist remains where it is not exposed to light or it develops away where it is exposed to light and the image is a replica or positive of the mask used) |
| positive photoresist system | positives Resistsystem (it leaves a positive image in the irradiated resist film after the expose and develop process, i.e. the photoresist remains where it is not exposed to light or it develops away where it is exposed to light and the image is a replica or positive of the mask used) |
| positive photoresist system | positives Fotoresistsystem (it leaves a positive image in the irradiated resist film after the expose and develop process, i.e., the photoresist remains where it is not exposed or it develops away where it is exposed to light and the image is a replica or positive of the mask used) |
| positive plane | Positivebene |
| positive plate | Plusplatte |
| positive power | positive Brechkraft |
| positive print | Positivbild (image) |
| positive print | Positivabzug |
| positive quantity | positive Größe |
| positive resist system | Positivlacksystem (it leaves a positive image in the irradiated resist film after the expose and develop process, i.e. the photoresist remains where it is not exposed to light or it develops away where it is exposed to light and the image is a replica or positive of the mask used) |
| positive resist system | positives Resistsystem (it leaves a positive image in the irradiated resist film after the expose and develop process, i.e. the photoresist remains where it is not exposed to light or it develops away where it is exposed to light and the image is a replica or positive of the mask used) |
| positive resist system | positives Fotoresistsystem (it leaves a positive image in the irradiated resist film after the expose and develop process, i.e., the photoresist remains where it is not exposed or it develops away where it is exposed to light and the image is a replica or positive of the mask used) |
| positive rotation | positive Drehung (rotatory polarization) |
| positive transparency | Diapositiv |
| positive vertical angle | positiver Vertikalwinkel |